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TMA
TMA is a broadly used aluminum precursor for deposition of thin films incorporated into memory, logic, and III-V semiconductor architectures.
Chemical Name: Aluminum, trimethyl-
CAS No: 75-24-1
Molecular Weight: 72.1 g/mol
Appearance: Liquid
Color: Colorless
Boiling Point: 125°C
Viscosity: 0.9 cP at 30°C